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Basic Info.
Product Description
ISO9001 99.9999999% 9N Argon-Production-Plant For Welding

7N Inert Gas Purification System
The 7N Inert Gas Purification System consists of two main parts: the gas circuit and the electronic control. The gas circuit
includes a high-temperature catalyst purification unit, multiple parallel low-temperature catalyst purification units, a series of pneumatic valves, gas pipelines, and heat exchangers. This system combines high-temperature catalysis and low-temperature adsorption to remove impurities such as H2O, O2, CO, CO2, CH4, NMHC, and H2 from the process gas, reducing them to less than 5 parts per billion (ppb). It can be equipped with particle filters with a filtration precision of 0.003 microns.

Flow Range: 30-6000 Nm³/h
Catalyst Units: One high-temperature catalyst unit and multiple low-temperature adsorption units; the initial stage does notrequire regeneration, while the later stage regenerates in situ
Product Model | 7N-30-I | 7N-300-I | 7N-1000-I |
Purifiable Gases | N2, Ar He, Xe, Ne, Kr | ||
Standard Flow Rate | 30Nm3/h,40Nm3/h,60Nm3/h,100Nm3/h,150Nm3/h,200Nm3/h | 300Nm3/h,400Nm3/h,600Nm3/h,800Nm3/h | 1000Nm3/h,1500Nm3/h,2000Nm3/h,3000Nm3/h,4000Nm3/h,6000Nm3/h |
Maximum Pressure | 1.0 | 1.0 | 1.0 |
Maximum Pressure Drop | 0.1 | 0.1 | 0.1 |
Particle Filter | 1 | N/A | N/A |
Removed Impurities | H2O, O2, CO, CO2, H2,CH4, NMHC | ||
Purification Performance | <5ppb |


7N Inert Gas Purification System | 9N Inert Gas Purification System |
9N Inert Gas Purification System
The 9N Inert Gas Purification System consists of two main parts: the gas circuit and the electronic control. The gas circuit
includes a high-temperature catalyst purification unit, multiple parallel low-temperature catalyst purification units, a series of pneumatic valves, gas pipelines, and heat exchangers. This system combines high-temperature catalysis and low-temperature adsorption to remove impurities such as H2O, O2, CO, CO2, CH4, NMHC, and H2 from the process gas, reducing them to less than 1 part per billion (ppb). It can be equipped with particle filters with a filtration precision of 0.003 microns.

Flow Range: 30-6000 Nm³/h
Catalyst Units: One high-temperature catalyst unit and multiple low-temperature adsorption units; the initial stage does not require regeneration, while the later stage regenerates in situ
Product Model | 9N-30-I | 9N-300-I | 9N-1000-I |
Purifiable Gases | N2, Ar He, Xe, Ne, Kr | ||
Standard Flow Rate | 30Nm3/h,40Nm3/h,60Nm3/h,100Nm3/h,150Nm3/h,200Nm3/h | 300Nm3/h,400Nm3/h,600Nm3/h,800Nm3/h | 1000Nm3/h,1500Nm3/h,2000Nm3/h,3000Nm3/h,4000Nm3/h,6000Nm3/h |
Maximum Pressure | 1.0 | 1.0 | 1.0 |
Maximum Pressure Drop | 0.1 | 0.1 | 0.1 |
Particle Filter | 0.003 | N/A | N/A |
Removed Impurities | H2O, O2, CO, CO2, H2,CH4, NMHC | ||
Purification Performance | <1ppb |



Large-scale Integrated Circuit Manufacturing | Semiconductor Discrete Device Manufacturing | Large Silicon Wafer Production |



Panel and Display Manufacturing | Optical Fiber Preform Production | High-efficiency Solar Cell Production |


LED and Laser Diode Manufacturing | Production of Ultra High Purity Gases, Mixed Gases, and Standard Gases |